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當前位置：泰州巨納新能源有限公司>>二維材料>>六方氮化硼晶體>> CVD銅基單層氮化硼薄膜
| 供貨周期 | 現貨 | 應用領域 | 環保,化工,能源,綜合 |
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Single layer h-BN (Boron Nitride) monolayer thick film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms. Our h-BN CVD process has been adopted in order that defect density has been kept low (~1E10-1E11 cm-2) and single domain sizes have been increased to reduce 1D grain boudary defect concentrations. Monolayer h-BN sheets measure ~5cm x 5cm or ~2x2 inches in size.
Properties of h-BN
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